Dr. Ronq Adnan Talib, a lecturer at the Polymer Research Centre, organized a seminar, entitled “RF-Sputtering”. She explained using of RF-Sputter, a device that used to deposit thin membranes using (Target) of different materials, whether semiconductors or insulators, as well as used for deposition of electrodes using a target of conductive materials and the deposition process is carried out in both cases at room temperature or at different temperatures and different thickness can be obtained from the membrane according to researcher requirements. She also pointed out the principle of device technique. In this technique, ionization of the Argon gas to Argon ion and releasing free electrons take place and result in generation the fourth state of the matter, called plasma. The ion of Argon takes off part of the target material and deposits it towards the bases.
