Dr Asaad Kareem Edaan, a lecturer at Basrah university has collaborated with a leading researcher from the university of Edinburgh, Prof Rebecca Cheung. They have published a paper entitled "Reactive ion etching of tantalum in silicon tetrachloride" in Scopus\Clarivate – indexed journal (Microelectronic Engineering). The journal is one of the premier journals that focuses on the fabrication and characterization of micro/nano-electronic materials, devices and circuits. In the paper, etching of tantalum-based layers has been performed using reactive ion etching. Particularly, an enhanced and controllable dry etching process of tantalum can be achieved by exploring the main factors that have a major impact on etching mechanism.
